MKS RPS AX7695

Product Description:

• The MKS RPS AX7695 is a Remote Plasma Source (RPS) designed for semiconductor wafer processing.  
• It’s part of the MKS R*evolution® III series, providing a clean source of atomic radicals for various processing applications.  
• It integrates a quartz vacuum chamber, RF power supply, and necessary controls into a compact unit.  
• It is designed to be installed directly on the tool process chamber.  
• It is used to bring about the desired reaction on the wafer, at a reduced level of complexity.  

Product Parameters and Specifications:

Here’s a summary of the key specifications:

• Manufacturer: MKS Instruments
• Model: AX7695
• Type: Integrated Remote Plasma Source
• Applications: Semiconductor wafer processing
• Key Features:
  • Provides a clean source of reactive gas species.  
  • Integrated design for easy installation.
  • High-performance plasma generation.
  • Ignition Gas Supply: 100% O2 or Ar, or 90% O2/10% N2.
  • Process Gas Supply: Up to 6.0 slm of 100% O2, or 90% O2/10% N2.  
  • Operating Pressure: 0.5 – 2.0 Torr @ 1.0 – 6.0 slm.  
  • Output: Up to 6 slm radicals.
  • Inputs: Plasma On/Off, Power Set.
  • Outputs:  
• General information:
  • Used in semiconductor manufacturing environments.
  • These units can be found refurbished through various vendors.

Key Points:

• The MKS AX7695 is a critical component in semiconductor manufacturing processes.
• It offers a high-performance and reliable source of plasma for demanding applications.
• When purchasing these kinds of items, especially used or refurbished, it is very important to verify the condition of the part, and any warranty information.