MKS RPS AX7695

The MKS RPS AX7695 module is a long-range plasma source manufactured by MKS Instruments for semiconductor manufacturing processes. It produces reactive gases, such as fluorine, NF3, oxygen, nitrogen and hydrogen, to react with the surface of the material, so as to achieve cleaning, etching and other treatments on the wafer surface.

Product name
MKS AX7695 long-range plasma source
MKS R*evolution III long-range RF plasma source
Product description
The AX7695 is part of the R*evolution III family of MKS Instruments. It integrates a quartz vacuum chamber to provide an efficient, clean reactive gas for semiconductor wafer processing. The module excites the gas by RF power to generate plasma, thus realizing the treatment of the wafer surface.

Main feature

High performance: Provides a high performance, clean reactive gas source for a variety of semiconductor processes.
Integrated design: Integrated quartz vacuum chamber, compact structure.
Multi-gas support: Support a variety of reactive gases such as fluorine, NF3, oxygen, nitrogen and hydrogen.
High reliability: Designed for harsh industrial environments with high reliability.
Application field

Semiconductor manufacturing: for wafer cleaning, etching and other processes.
Thin film deposition: Used for plasma assistance during thin film deposition.
Surface treatment: Used for material surface modification.